A soothing skin recovery mask specially formulated for post-procedure and sensitive skin. Its key ingredients include DNA, which repairs external skin damage, Ceramide NP, which creates a protective skin barrier preventing moisture loss. Allantoin, Arginine, and Centella Asiatica Leaf Extract helps to maintain hydration, prevent moisture loss, and soothe sensitive skin, while Acetyl Hexapeptide-8 improves the skin?s elasticity and prevents wrinkles.